Evaluation of Mo-Based Multilayer EUV Mirrors

Hisataka Takenaka, Tomoaki Kawamura, Yoshikazu Ishii, Tsuneyuki Haga, and Hiroo Kinoshita

EC.26 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Multilayer Coatings for the EUV Lithography Front-End Test Bed

S. P. Vernon, M. J. Carey, D. P. Gaines, and F. J. Weber

EC.33 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Coating Strategy for Enhancing Illumination Uniformity in a Lithographic Condenser

David P. Gaines, Stephen P. Vernon, Gary E. Sommargren, and Donald R. Kania

EC.41 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Multilayer Facilities for EUV Lithography

D. L. Windt and W. K. Waskiewicz

EC.47 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Beryllium Based Multilayers for Normal Incidence EUV Reflectance

Ken Skulina, Craig Alford, Richard Bionta, Dan Makowiecki, E. M. Gullikson, Regina Soufli, J. B. Kortright, and J. H. Underwood

EC.52 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Achievement of Low Stress in Mo/Si Multilayer Mirrors

Tai D. Nguyen, Chantal Khan-Malek, and James H. Underwood

EC.56 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Effect of Contamination and Oxide Layers on Scattering and Reflectivity of Multilayer Mirrors

J. H. Underwood, E. M. Gullikson, Waiman Ng, Avijit Ray-Chaudhuri, and Franco Cerrina

EC.61 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Lithography: Today’s Performance, Tomorrow’s Challenges

Karen H. Brown

ELPM.2 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

193 nm—Moderately EUV

M. Rothschild

ELPM.10 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

EUV Lithography Cost of Ownership Analysis

Andrew M. Hawryluk and Natale M. Ceglio

ELPM.13 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

The Elusive Diffraction Limit

David M. Williamson

EOS.68 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Specification of the Figure and Finish of EUV Mirrors in Terms of Performance Requirements

E. L. Church and P. Z. Takacs

EOS.77 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Experiments and Simulations of EUV Lithographic Resist Patterning at Wavelengths from 7 to 40 nm

O. R. Wood, J. E. Bjorkholm, K. F. Dreyer, L. Fetter, M. D. Himel, R. R. Freeman, D. M. Tennant, J. E. Griffith, G. N. Taylor, W. K. Waskiewicz, D. L. White, D. L. Windt, A.A. MacDowell, B. La Fontaine, B. M. Lum, A. R., Neureuther, J. B. Kortright, E. M. Gullikson, and K. B. Nguyen

EOS.83 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

10x Reduction Imaging at 13.4 nm

D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, S. J. Haney, K. W. Berger, R. P. Nissen, G. A. Wilkerson, R. H. Stulen, P. H. Paul, R. W. Arling, T. E. Jewell, Edita Tejnil, W. C. Sweatt, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, L. A. Fetter, O. R. Wood, W. K. Waskiewicz, D. L. White, and D. L. Windt

EOS.89 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Four-Mirror Ring-Field System for EUV Projection Lithography

Tanya E. Jewell

EOS.98 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Performance of a Two Mirror, Four Reflection, Ring Field Imaging System

Gary E. Sommargren

EOS.103 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Critical Illumination Condenser for EUV Projection Lithography

Simon J. Cohen and Lynn G. Seppala

EOS.109 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Simulation of Non-uniformities in Sources and Optics in Projection Printing

Derek C. Lee and Andrew R. Neureuther

EOS.116 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Soft X-Ray Projection Imaging at 4.5 nm using Schwarzschild Optics

Katsuhiko Murakami, Hiroshi Nagata, Masayuki Ohtani, Hiroaki, Oizumi, Yoshio Yamashita, and Nobufumi Atoda

EOS.122 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Investigation of Image Defects in EUV Lithography Experiments

W. C. Sweatt and W. W. Chow

EOS.126 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Limitations to Silylated Resist Technology

Gary N. Taylor, Richard S. Hutton, Susan M. Stein, Craig H. Boyce, Bruno LaFontaine, Alastair MacDowell, and David R. Wheeler

RMM.182 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Validation of Modeling Hoechst AZ PN114 for EUV Projection Lithography and Investigation of Diffusion Effects

Bernice M. Lum, Andrew R. Neureuther, Bruno La Fontaine, Alastair A. MacDowell, and Obert R. Wood

RMM.184 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Imaging of EUV Lithographic Masks with Programmed Substrate Defects

K. B. Nguyen, D. T. Attwood, T. Mizota, T. Haga, and H. Kinoshita

RMM.193 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

EUV Reticle Pattern Repair Experiments using 10 KeV Neon Ions

A. M. Hawryluk, D. R. Kania, P. Celliers, L. DaSilva, A. Stith, D. Stewart, and S. Mrowka

RMM.204 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Defects in Coatings Deposited by Planar Magnetron Sputtering: Measurements with a Tencor Surfscan 6200

Khanh B. Nguyen, Paul Resnick, Bruce Draper, Paul Mahl, James H. Underwood, Daniel Chen, and Paul Denham

RMM.209 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Quartz Substrates for EUV Lithography Reticles

D. R. Kania, F. J. Weber, S. P. Vernon, A. Hawryluk, S. L. Baker, A. M. Golub, A. Shikata, and E. C. Grady

RMM.217 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Recovery of EUV Lithography Substrates

S. P. Vernon and S. L. Baker

RMM.222 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Discussion of Mask Alignment Accuracy for EUV Lithography

Yasuyuki Saito

RMM.227 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Experience in EUV Photoemission with Multilayer Coated Optics

Franco Cerrina

RT.280 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

High Average Power Laser for EUV Lithography

D. R. Kania, D. P. Gaines, M. Hermann, J. Honig, R. Hostetler, R. Levesque, G. E. Sommargren, R. C. Spitzer, and S. P. Vernon

SEL.234 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

High Average Power Solid-State Laser for EUV Lithography

Mark Hermann, John Honig, and Lloyd Hackel

SEL.238 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Advanced Source Studies on Laser Produced Plasmas for EUV Lithography

R. C. Spitzer and D. P. Gaines

SEL.243 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Cryogenic Pellet Laser Plasma Source Targets

Glenn D. Kubiak, Kevin D. Krenz, Kurt W. Berger, Timothy G. Trucano, Paul W. Fisher, and Michael J. Gouge

SEL.248 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Detailed EUV Characterization of Laser-Plasma Sources for EUV Lithography*

Paul D. Rockett, John A. Hunter, Glenn D. Kubiak, Kevin Krenz, Harry Shields, and Michael Powers

SEL.255 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Conversion Efficiency and Debris Studies of Ice Targets for EUV Projection Lithography

F. Jin and M. Richardson

SEL.260 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Performance Criteria of Mass-Limited Ice Laser Plasma Targets for EUV Lithography

Martin Richardson and Feng Jin

SEL.265 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Debris Free, Electron Beam Driven, Lithography Source at 130Å

R. D. Fulton, J. Abdallah, J. C. Goldstein, M. E. Jones, D. P. Kilcrease, J. M. Kinross-Wright, S. H. Kong, and D. C. Nguyen

SEL.270 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Electron-Gun-Driven EUV Lithography System

Alan M. M. Todd, Ira S. Lehrman, Jayaram Krishnaswamy, Vincent Calia, and Robert Gutowski

SEL.274 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Point Diffraction Interferometry at EUV Wavelengths

K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, D. T. Attwood, G. E. Sommargren, J. P. Spallas, and R. Hostetler

TEO.134 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Scalar Wave Diffraction from a Circular Aperture

C. Cerjan

TEO.142 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

At-Wavelength Metrology of EUV Cameras using Lateral-Shearing Interferometry

Z. Tan, A. A. MacDowell, B. La Fontaine, J. Russo, J. E. Bjorkholm, D. Tennant, D. Taylor, M. Himel, O. R. Wood, R R. Freeman, W. K. Waskiewicz, D. L. Windt, D. White, S. Spector, A. K. Ray-Chaudhuri, and R. H. Stulen

TEO.151 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

EUV Metrology of Multilayer Optics

A. K. Ray-Chaudhuri, R. H. Stulen, W. Ng, F. Cerrina, S. Spector, Z. Tan, J. Bjorkholm, and D. Tennant

TEO.161 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Extreme Ultraviolet Moiré Interferometry

B. La Fontaine, D. L. White, A. A. MacDowell, Z. Tan, D. M. Tennant, and O. R. Wood

TEO.167 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

EUV Characterization of a Four-Bounce Projection System

David P. Gaines, Stephen P. Vernon, Gary E. Sommargren, and Detlef Fuchs

TEO.171 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF

Real-time, Sub-Micron Fluorescence Imaging of Extreme Ultraviolet Aerial Images

B. La Fontaine, A. A. MacDowell, Z. Tan, G. N. Taylor, D. L. White, D. M. Tennant, and O. R. Wood

TEO.177 Extreme Ultraviolet Lithography (EUL) 1994 View: PDF