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Optica Publishing Group
  • Journal of the Optical Society of Korea
  • Vol. 7,
  • Issue 3,
  • pp. 160-165
  • (2003)

Micromachining of Cr Thin Film and Glass Using an Ultrashort Pulsed Laser

Open Access Open Access

Abstract

Materials processing by ultrashort pulsed laser is actively being applied to micromachining technology due to its advantages with regard to non-thermal machining. In this study, materials processing with ultrashort pulses was studied by using the high repetition rate of a 800 nm Ti:sapphire regenerative amplifier. This revealed that the highly precise micromachining of metallic thin film and bulk glass with a minimal heat affected zone (HAZ) could be obtained by using near damage threshold energy. Grooves with diffraction limited sub-micrometer width were obtained with widths of 620 nm on Cr thin film and 800 nm on a soda-lime glass substrate. The machined patterns were investigated through SEM images. We also phenomenologically examined the influence of variations of parameters and proposed the optimal process conditions for microfabrication.

© 2003 Optical Society of Korea

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