Abstract
Electrical properties of indium-zinc oxide (IZO) thin-film-transistors
(TFTs) based on solution processes with various channel compositions are
investigated in this paper. Amorphous IZO thin films with high transparency
and smooth/uniform surfaces are deposited by spin-coating. The In:Zn ratio
is varied by adjusting the precursor compositions, and its influences on the
electrical properties, such as resistivity, mobility, and threshold voltage,
etc., of IZO films and TFTs are studied. The devices showed field effect
mobility ranging from 0.07 to 2.13 cm<sup>2</sup>/V · s with the In component (In + Zn)) varying from 0.2 to 0.5.
© 2009 IEEE
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