Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Journal of Lightwave Technology
  • Vol. 31,
  • Issue 21,
  • pp. 3368-3373
  • (2013)

Fabrication of Crystalline Si Waveguides on (1 0 0) Bulk Si Substrate Using Laser Reformation Method

Not Accessible

Your library or personal account may give you access

Abstract

Optical solution has been proposed for short-reach interconnects. A primary concern is the integration of photonics and electronics. A method to fabricate crystalline Si waveguides on insulator from bulk Si substrate using a laser reformation technique is here presented. A high-power laser is used to melt and reshape a Si fin structure. This is followed by an oxidation process to produce oxide as an optical isolation layer beneath the Si and form the waveguide structure. The Si waveguide, using laser reformation method in our experiment, has 140 nm width and 420 nm height, showing a single mode property and an effective refractive index of about 2.09. It represents a viable method for creating crystalline Si waveguides on CMOS-compatible Si substrate and reveals the potential of Si photonic devices integrated with Si electronics.

© 2013 CC

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved