Optical Constants and Reflectance and Transmittance of Evaporated Aluminum in the Visible and Ultraviolet*

G. Hass; J. E. Waylonis

doi:10.1364/JOSA.51.000719

Journal of the Optical Society of America
Vol. 51,
Issue 7,
pp. 719-722
(1961)
•https://doi.org/10.1364/JOSA.51.000719

Optical Constants and Reflectance and Transmittance of Evaporated Aluminum in the Visible and Ultraviolet

G. Hass and J. E. Waylonis

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G. Hass and J. E. Waylonis, "Optical Constants and Reflectance and Transmittance of Evaporated Aluminum in the Visible and Ultraviolet*," J. Opt. Soc. Am. 51, 719-722 (1961)

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Abstract

The paper presents new measurements of the optical constants and of the reflectance and transmittance of evaporated aluminum films produced from the purest grade of aluminum with extremely fast evaporation at about 10⁻⁵ mm Hg. The optical constants were determined by Drude’s polarimetric method from opaque films and by reflectance, transmittance, and true thickness measurements of semitransparent films. The following results were obtained.

λ (mμ)	220	260	300	340	380	436	492	546	578	650
n	0.14	0.19	0.25	0.31	0.37	0.47	0.64	0.82	0.93	1.30
k	2.35	2.85	3.33	3.80	4.25	4.84	5.50	5.99	6.33	7.11
R%	91.8	92.0	92.1	92.3	92.6	92.6	92.2	91.6	91.5	90.7

For extremely fast evaporated films the optical constants were found to remain unchanged down to film thicknesses of less than 100 A. Data are given on the reflectance and transmittance of semitransparent aluminum films on glass and fused quartz as a function of wavelength from 220 mμ to 650 mμ.

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λ (mμ)	Percent reflectance Substrate temperature (°C)
λ (mμ)	30°	50°	100°	150°	200°
A. Deposition rate ~300 A/sec
220	30°	91.5	91.3	90.0	87.9	83.8
260	92.2	92.1	91.5	90.4	88.4
300	92.3	92.3	91.9	91.2	90.2
400	92.4	92.3	92.0	91.7	91.5
500	91.7	91.7	91.5	91.4	91.3
600	91.0	90.9	90.8	90.7	90.5
B. Deposition rate ~10–15 A/sec
220	89.0	88.9	86.0	65.2	46.6
260	91.2	91.0	89.9	73.5	56.7
300	91.8	91.7	91.2	79.2	64.9
400	92.0	91.9	91.7	87.4	77.9
500	91.6	91.5	91.5	89.5	83.9
600	90.9	90.9	90.8	89.6	86.7

	Percent reflectance Angle of vapor incidence
	0° (normal incidence)		30°		60°
	t ~ 600 A	t ~ 2000 A	t ~ 600 A	t ~ 2000 A	t ~ 600 A	t ~ 2000
A. Optimum evaporation conditions.
(Deposition rate 300 A/sec, $p = 1 \times 10^{- 5} mm Hg .$ )
220	91.5	91.2	91.4	90.7	90.4	75.0
260	92.2	91.9	92.0	91.7	91.5	82.2
300	92.3	92.2	92.1	91.8	91.8	85.5
400	92.4	92.2	92.1	91.9	91.8	88.5
500	91.7	91.7	91.6	91.6	91.5	90.0
600	91.0	90.9	90.9	90.8	90.8	89.6
B. Poor evaporation conditions.
(Deposition rate 10 A/sec, $p = 1 \times 10^{- 4} mm Hg .$ )
220	83.5	65.9	82.6	60.5	81.4	31.8
260	88.4	74.1	88.2	70.5	87.6	42.5
300	90.5	79.5	90.4	75.9	89.6	53.2
400	91.3	86.8	91.3	83.2	91.0	72.0
500	91.0	88.8	91.0	87.5	90.8	81.3
600	90.3	89.3	90.2	89.0	90.0	84.7

Film thickness (A)	Wavelength (mμ)
	220		300		400		546		650
	R%	T%	R%	T%	R%	T%	R%	T%	R%	T%
40	14	82	19	74	25	65	33	51	38	42
80	33	60	43	47	52	36	60	24	63	18
120	52	40	62	27	70	19	74	12	75	9
160	67	25	74	16	79	11	81	7	82	5
200	76.3	15.2	81.5	9.1	84.9	5.9	85.6	3.5	85.4	2.6
240	82.4	9.1	86.0	5.1	88.1	3.3	88.1	2.0	87.5	1.4
280	86.2	5.4	88.4	3.1	90.0	1.9	89.5	1.1	88.8	0.8
320	88.5	3.2	90.0	1.8	91.1	1.1	90.4	0.5	89.6	0.4
360	89.8	1.9	90.9	1.0	91.7	0.6	90.9	0.4	90.0	0.3
400	90.6	1.1	91.4	0.5	92.1	0.4	91.2	0.2	90.3	0.2
500	91.5	0.3	92.0	0.1	92.5	<0.1	91.5	<0.1	90.6	<0.1

λ (mμ)	Percent reflectance Substrate temperature (°C)
λ (mμ)	30°	50°	100°	150°	200°
A. Deposition rate ~300 A/sec
220	30°	91.5	91.3	90.0	87.9	83.8
260	92.2	92.1	91.5	90.4	88.4
300	92.3	92.3	91.9	91.2	90.2
400	92.4	92.3	92.0	91.7	91.5
500	91.7	91.7	91.5	91.4	91.3
600	91.0	90.9	90.8	90.7	90.5
B. Deposition rate ~10–15 A/sec
220	89.0	88.9	86.0	65.2	46.6
260	91.2	91.0	89.9	73.5	56.7
300	91.8	91.7	91.2	79.2	64.9
400	92.0	91.9	91.7	87.4	77.9
500	91.6	91.5	91.5	89.5	83.9
600	90.9	90.9	90.8	89.6	86.7

	Percent reflectance Angle of vapor incidence
	0° (normal incidence)		30°		60°
	t ~ 600 A	t ~ 2000 A	t ~ 600 A	t ~ 2000 A	t ~ 600 A	t ~ 2000
A. Optimum evaporation conditions.
(Deposition rate 300 A/sec, $p = 1 \times 10^{- 5} mm Hg .$ )
220	91.5	91.2	91.4	90.7	90.4	75.0
260	92.2	91.9	92.0	91.7	91.5	82.2
300	92.3	92.2	92.1	91.8	91.8	85.5
400	92.4	92.2	92.1	91.9	91.8	88.5
500	91.7	91.7	91.6	91.6	91.5	90.0
600	91.0	90.9	90.9	90.8	90.8	89.6
B. Poor evaporation conditions.
(Deposition rate 10 A/sec, $p = 1 \times 10^{- 4} mm Hg .$ )
220	83.5	65.9	82.6	60.5	81.4	31.8
260	88.4	74.1	88.2	70.5	87.6	42.5
300	90.5	79.5	90.4	75.9	89.6	53.2
400	91.3	86.8	91.3	83.2	91.0	72.0
500	91.0	88.8	91.0	87.5	90.8	81.3
600	90.3	89.3	90.2	89.0	90.0	84.7

λ (mμ)	n	k	Reflectance
λ (mμ)	n	k	calc.	meas.
Calculated from R, T, and t
220	0.14	2.35	91.8	91.5
240	0.16	2.60	92.1	91.9
260	0.19	2.85	92.0	92.2
280	0.22	3.13	92.2	92.3
300	0.25	3.35	92.1	92.3
320	0.28	3.56	92.2	92.4
340	0.31	3.80	92.3	92.5
360	0.34	4.01	92.4	92.5
380	0.37	4.25	92.6	92.5
400	0.40	4.45	92.6	92.4
450	0.51	5.00	92.5	92.2
546	0.80	5.92	91.6	91.6
Drude’s polarimetric method
436	0.47	4.84	92.6	92.3
492	0.64	5.50	92.2	91.9
546	0.82	5.99	91.6	91.6
578	0.93	6.33	91.5	91.4
650	1.30	7.11	90.7	90.5

Abstract

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Journal of the Optical Society of America