Abstract

Methods are described for determining the refractive indices of dielectric films and substrates and the thickness of the film. The determination makes use of a single measured distribution of monochromatic, specular reflectance as a function of incidence angle. The methods are based on certain properties of the reflectance maxima and minima, which properties are deduced from electromagnetic theory. Either perpendicular-polarized or parallel-polarized light may be employed; the latter has some advantage, in that it provides a cross check on one of the results and also facilitates the treatment of very thin films.

© 1971 Optical Society of America

Methods for Determining Film Thickness and Optical Constants of Films and Substrates

M. Ruiz-Urbieta, E. M. Sparrow, and E. R. G. Eckert
J. Opt. Soc. Am. 61(3) 351-359 (1971)

Refractive Index, Thickness, and Extinction Coefficient of Slightly Absorbing Thin Films

M. Ruiz-Urbieta and E. M. Sparrow
J. Opt. Soc. Am. 62(8) 931-937 (1972)

Reflection Polarization by a Transparent-Film–Absorbing-Substrate System

M. Ruiz-Urbieta and E. M. Sparrow
J. Opt. Soc. Am. 62(10) 1188-1194 (1972)

Determination of Refractive Index and Film Thickness from Interference Fringes

N. J. Harrick
Appl. Opt. 10(10) 2344-2349 (1971)

Ellipsometry of Anisotropic Films

D. den Engelsen
J. Opt. Soc. Am. 61(11) 1460-1466 (1971)