Abstract

The field-stitching method introduced previously [Opt. Lett. 21, 1508 (1996)] allows large-period gratings containing small-scale local structure to be analyzed without requiring excessive computing power. Multiple scattering and the polarization of the electromagnetic field are taken into account by standard rigorous analysis. A variety of calculations demonstrating the accuracy and the speed of the method are made. Also, we report on the optimization by simulated annealing of fan-out gratings with periods of up to 240λ and of diffractive cylindrical lenses with a period of 1200λ, which has been made possible by field-stitching analysis.

© 1997 Optical Society of America

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