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Genetic algorithm for ellipsometric data inversion of absorbing layers

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Abstract

A new data reduction method is presented for single-wavelength ellipsometry. A genetic algorithm is applied to ellipsometric data to find the best fit. The sample consists of a single absorbing layer on a semi-infinite substrate. The genetic algorithm has good convergence and is applicable to many different problems, including those with different independent measurements and situations with more than two angles of incidence. Results are similar to those obtained by other inversion techniques.

© 2000 Optical Society of America

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