Abstract

A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins’s image model. The models are scalar models and apply to planar, perfectly conducting mask objects.

© 2004 Optical Society of America

On the usual approximation used in the Rayleigh–Sommerfeld diffraction theory

Arvind S. Marathay and John F. McCalmont
J. Opt. Soc. Am. A 21(4) 510-516 (2004)

Simulation of Mechanically Ruled Concave Diffraction Gratings by Use of an Original Geometric Theory

Elena Sokolova
Appl. Opt. 43(1) 20-28 (2004)

Image formation of polygons by refraction optics: a theory based on electromagnetic diffraction

H. A. M. van den Berg
J. Opt. Soc. Am. 72(2) 278-287 (1982)

Spectral methods in edge-diffraction theories

J. M. Arnold
J. Opt. Soc. Am. A 9(12) 2192-2205 (1992)

Incorporating mask topography edge diffraction in photolithography simulations

Jaione Tirapu-Azpiroz and Eli Yablonovitch
J. Opt. Soc. Am. A 23(4) 821-828 (2006)