Abstract
A promising maskless surface-plasmon-interference nanoscale lithographic technique is proposed and demonstrated experimentally in this paper. One-dimensional (grating-type) and two-dimensional (pillar-type) nanocale features were patterned on the photoresist layer using a illumination wavelength source with a single exposure, by employing a custom-made prism layer configuration. Large-area patterns of grating lines and pillars with feature size were realized experimentally using this configuration.
© 2009 Optical Society of America
Full Article | PDF ArticleMore Like This
Kandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, and Vadakke Matham Murukeshan
Appl. Opt. 49(35) 6710-6717 (2010)
Xuefeng Yang, Beibei Zeng, Changtao Wang, and Xiangang Luo
Opt. Express 17(24) 21560-21565 (2009)
Beibei Zeng, Xufeng Yang, Changtao Wang, and Xiangang Luo
Opt. Express 17(19) 16783-16791 (2009)