Abstract

Efficient coupling between optical fibers and high-index-contrast silicon waveguides is essential for the development of integrated nanophotonics. Herein, a high-efficiency dual-layer grating coupler is demonstrated for vertical polarization-diversity fiber-chip coupling. The two waveguide layers are orthogonally distributed and designed for $y$- and $x$-polarized ${{\rm LP}_{01}}$ fiber modes, respectively. Each layer consists of two 1D stacked gratings, allowing for both perfectly vertical coupling and high coupling directionality. The gratings are optimized using the particle swarm algorithm with a preset varying trend of parameters to thin out the optimization variables. The interlayer thickness is determined to ensure efficient coupling of both polarizations. The optimized results exhibit record highs of 92% (${-}{0.38}\;{\rm dB}$) and 85% (${-}{0.72}\;{\rm dB}$) 3D finite-difference time-domain simulation efficiencies for $y$ and $x$ polarizations, respectively. The polarization-dependent loss (PDL) is below 2 dB in a 160 nm spectral bandwidth with cross talk between the two polarizations less than ${-}{24}\;{\rm dB}$. Fabrication imperfections are also investigated. Dimensional offsets of ${\pm} {10}\;{\rm nm}$ in etching width and ±8 nm in lateral shift are tolerated for a 1 dB loss penalty. The proposed structure offers an ultimate solution for polarization diversity coupling schemes in silicon photonics with high directionality, low PDL, and a possibility to vertically couple.

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