Generation of vacuum-ultraviolet light below 160 nm in a KBBF crystal by the fifth harmonic of a single-mode Ti:sapphire laser

Teruto Kanai; Takeshi Kanda; Taro Sekikawa; Shuntaro Watanabe; Tadashi Togashi; Chuangtian Chen; Chengqian Zhang; Zuyan Xu; Jiyang Wang

doi:10.1364/JOSAB.21.000370

Journal of the Optical Society of America B
Vol. 21,
Issue 2,
pp. 370-375
(2004)
•https://doi.org/10.1364/JOSAB.21.000370

Generation of vacuum-ultraviolet light below 160 nm in a KBBF crystal by the fifth harmonic of a single-mode Ti:sapphire laser

Teruto Kanai, Takeshi Kanda, Taro Sekikawa, Shuntaro Watanabe, Tadashi Togashi, Chuangtian Chen, Chengqian Zhang, Zuyan Xu, and Jiyang Wang

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Teruto Kanai, Takeshi Kanda, Taro Sekikawa, Shuntaro Watanabe, Tadashi Togashi, Chuangtian Chen, Chengqian Zhang, Zuyan Xu, and Jiyang Wang, "Generation of vacuum-ultraviolet light below 160 nm in a KBBF crystal by the fifth harmonic of a single-mode Ti:sapphire laser," J. Opt. Soc. Am. B 21, 370-375 (2004)

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Abstract

We have generated a vacuum-ultraviolet light below 160 nm by sum-frequency mixing in an optically contacted, prism-coupled ${KBe}_{2} {BO}_{3} F_{2}$ crystal. The vacuum-ultraviolet light was generated as the fifth harmonic of a tunable, single-mode, 1-kHz Ti:sapphire laser system. The wavelength of 156 nm, to our knowledge, is the shortest ever obtained by use of nonlinear crystals in a phase-matched process. In addition, we demonstrated a 157.6-nm light source as an inspection tool for $F_{2}$ laser lithography with an average power of 0.8 µW.

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(A) Frq. Mix.	Crystal	Wavelength	Avg. Power	Efficiency
ω		788 nm	4.2 W
$ω + ω$	LBO	394 nm	700 mW	42%
$ω + 2 ω$	BBO	262.7 nm	300 mW	43%
$ω + 3 ω$	BBO	197 nm	50 mW	17%
$ω + 4 ω$	KBBF	157.6 nm	0.8 µW	0.0016%
(B)
ω		788 nm
$ω + ω$	LBO	394 nm	700 mW	42%
$2 ω + 2 ω$	KBBF	197 nm	4.5 mW	0.64%

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Journal of the Optical Society of America B