Abstract
Ultrafast pulsed laser deposition was used to successfully deposit atomically smooth 5-μm-thick films. The as-deposited films were photosensitive at wavelengths close to the band edge (≈520 nm), and waveguides could be directly patterned into them by photodarkening using an argon-ion or frequency-doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photodarkened waveguides were <0.2 dB/cm at wavelengths beyond 1200 nm and <0.1 dB/cm in as-deposited films. The third-order nonlinearity, was measured using both four-wave mixing and the Z-scan technique and varied with wavelength from 100 to 200 times fused silica between 1500 nm and 1100 nm with low nonlinear absorption.
© 2003 Optical Society of America
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