Abstract

We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts FWHM pixel sizes of $110\times 110\mathrm{nm}$ and writing times of $\sim 20\mathrm{ms}∕\mathrm{pixel}$.

© 2006 Optical Society of America

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