Abstract

Film thickness plays a crucial role in determining the position and depth of lossy mode resonance (LMR). Herein, we explore the overall film thickness dependency of LMR properties of pulsed-laser-deposited metallic indium-rich indium tin oxide (ITO) thin films by employing a simple Kretschmann–Raether geometry. It is observed that the depth of LMR is increased monotonically with increasing film thickness. Extremely high attenuation values of ${-}{{20}}\;{\rm{dB}}$ for transverse electric and ${-}{{10}}\;{\rm{dB}}$ for transverse magnetic polarizations are achieved for the film with the greatest film thickness. Also, the LMR positions are considerably redshifted with increasing thickness. A numerical simulation algorithm based on the modified transfer matrix method, where surface roughness is taken into account with the application of anisotropic Bruggemann effective medium approximation, is used to simulate the experimental LMR spectra for all vacuum-deposited ITO thin films effectively. As an application of this study, refractive index (RI) sensing is demonstrated in the RI range of 1.3325–1.4459, and highest sensitivity values of 3840 nm/RIU and 2542 nm/RIU are accomplished for transverse electric and transverse magnetic polarizations, respectively. This study will help in attaining a deep level of understanding of the film thickness effect on thin film based LMR and elevate metallic indium-rich ITO as an excellent material template for LMR studies.

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