Initiator-free photo-cross-linkable cellulose-based resists for fabricating submicron patterns via direct laser writing

Maximilian Rothammer; Dominic T. Meiers; Maximilian Maier; Georg von Freymann; Georg von Freymann; Cordt Zollfrank

doi:10.1364/JOSAB.479654

Journal of the Optical Society of America B
Vol. 40,
Issue 4,
pp. 849-855
(2023)
•https://doi.org/10.1364/JOSAB.479654

Initiator-free photo-cross-linkable cellulose-based resists for fabricating submicron patterns via direct laser writing

Maximilian Rothammer, Dominic T. Meiers, Maximilian Maier, Georg von Freymann, and Cordt Zollfrank

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Maximilian Rothammer, Dominic T. Meiers, Maximilian Maier, Georg von Freymann, and Cordt Zollfrank, "Initiator-free photo-cross-linkable cellulose-based resists for fabricating submicron patterns via direct laser writing," J. Opt. Soc. Am. B 40, 849-855 (2023)

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- Optical Materials
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About this Article
History
- Original Manuscript: October 28, 2022
- Revised Manuscript: February 13, 2023
- Manuscript Accepted: February 17, 2023
- Published: March 24, 2023
Virtual Issues
JOSA B Feature Issue: Tailored Disorder—Materials Design for Advanced Photonic Applications (2023)

Abstract

Novel bifunctional cellulose diacetate derivatives were synthesized in order to achieve bio-based photoresists, which can be structured by two-photon absorption via direct laser writing (DLW) without the need to use a photoinitiator. Therefore, cellulose diacetate is functionalized with thiol moieties and olefinic or methacrylic side groups enabling thiol-conjugated cross-linking. These cellulose derivatives are also photo-cross-linkable via UV irradiation ($\lambda = 254 \;{\rm{nm}}$ and 365 nm) without using an initiator.

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