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Optica Publishing Group
  • Journal of the Optical Society of Korea
  • Vol. 14,
  • Issue 3,
  • pp. 266-276
  • (2010)

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

Open Access Open Access


In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 <TEX>${\mu}m$</TEX> resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 <TEX>${\mu}m$</TEX> line width.

© 2010 Optical Society of Korea

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