Abstract
This paper discusses the etching kinetics of a LiYF<sub>4</sub>:Nd<sup>3+</sup> crystal in HNO<sub>3</sub> solutions at various etchant concentrations and temperatures. The etching rates of the crystal along the three principal crystallographic directions are determined. The resulting data make it possible to optimize and control the etching process, which increases the mechanical strength and thermal stability of LiYF<sub>4</sub>:Nd<sup>3+</sup> crystals.
© 2007 Optical Society of America
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