M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask prepared by electron beam lithography,” Microelectron. Eng. 88(8), 2338–2341 (2011).
[Crossref]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration,” Opt. Express 19(9), 8888–8902 (2011).
[Crossref] [PubMed]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Fully complimentary metal-oxide-semiconductor compatible nanoplasmonic slot waveguides for silicon electronic photonic integrated circuits,” Appl. Phys. Lett. 98(2), 021107 (2011).
[Crossref]

Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[Crossref] [PubMed]

Z. Han, A. Y. Elezzabi, and V. Van, “Experimental realization of subwavelength plasmonic slot waveguides on a silicon platform,” Opt. Lett. 35(4), 502–504 (2010).
[Crossref] [PubMed]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

I. De Leon and P. Berini, “Amplification of long-range surface plasmons by a dipolar gain medium,” Nat. Photonics 4(6), 382–387 (2010).
[Crossref]

J. N. Caspers, N. Rotenberg, and H. M. van Driel, “Ultrafast silicon-based active plasmonics at telecom wavelengths,” Opt. Express 18(19), 19761–19769 (2010).
[Crossref] [PubMed]

M. V. Ermolenko, O. V. Buganov, S. A. Tikhomirov, V. V. Stankevich, S. V. Gaponenko, and A. S. Shulenkov, “Ultrafast all-optical modulator for 1.5 μm controlled by Ti:Al2O3 laser,” Appl. Phys. Lett. 97(7), 073113 (2010).
[Crossref]

S. Sederberg, V. Van, and A. Y. Elezzabi, “Monolithic integration of plasmonic waveguides into a complimentary metal-oxide-semiconductor- and photonic-compatible platform,” Appl. Phys. Lett. 96(12), 121101 (2010).
[Crossref]

A. V. Krasavin and A. V. Zayats, “Electro-optic switching element for dielectric-loaded surface plasmon polariton waveguides,” Appl. Phys. Lett. 97(4), 041107 (2010).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref] [PubMed]

K. F. MacDonald, Z. L. Sámson, M. I. Stockman, and N. I. Zheludev, “Ultrafast active plasmonics,” Nat. Photonics 3(1), 55–58 (2009).
[Crossref]

A. Y. Elezzabi, Z. Han, S. Sederberg, and V. Van, “Ultrafast all-optical modulation in silicon-based nanoplasmonic devices,” Opt. Express 17(13), 11045–11056 (2009).
[Crossref] [PubMed]

M. Ambati, S. H. Nam, E. Ulin-Avila, D. A. Genov, G. Bartal, and X. Zhang, “Observation of stimulated emission of surface plasmon polaritons,” Nano Lett. 8(11), 3998–4001 (2008).
[Crossref] [PubMed]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
[Crossref]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J.-Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[Crossref] [PubMed]

E. Ozbay, “Plasmonics: merging photonics and electronics at nanoscale dimensions,” Science 311(5758), 189–193 (2006).
[Crossref] [PubMed]

T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “Surface plasmon polariton based modulators and switches operating at telecom wavelengths,” Appl. Phys. Lett. 85(24), 5833–5836 (2004).
[Crossref]

K. J. Chau, S. E. Irvine, and A. Y. Elezzabi, “A gigahertz surface magneto-plasmon optical modulator,” IEEE J. Quantum Electron. 40(5), 571–579 (2004).
[Crossref]

D. J. Bergman and M. I. Stockman, “Surface plasmon amplification by stimulated emission of radiation: quantum generation of coherent surface plasmons in nanosystems,” Phys. Rev. Lett. 90(2), 027402 (2003).
[Crossref] [PubMed]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

F. E. Doany, D. Grischkowsky, and C. C. Chi, “Carrier lifetime versus ion-implantation dose in silicon on sapphire,” Appl. Phys. Lett. 50(8), 460–462 (1987).
[Crossref]

P. A. Schumann and R. P. Phillips, “Comparison of classical approximations to free carrier absorption in semiconductors,” Solid-State Electron. 10(9), 943–948 (1967).
[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

M. Ambati, S. H. Nam, E. Ulin-Avila, D. A. Genov, G. Bartal, and X. Zhang, “Observation of stimulated emission of surface plasmon polaritons,” Nano Lett. 8(11), 3998–4001 (2008).
[Crossref] [PubMed]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref] [PubMed]

M. Ambati, S. H. Nam, E. Ulin-Avila, D. A. Genov, G. Bartal, and X. Zhang, “Observation of stimulated emission of surface plasmon polaritons,” Nano Lett. 8(11), 3998–4001 (2008).
[Crossref] [PubMed]

D. J. Bergman and M. I. Stockman, “Surface plasmon amplification by stimulated emission of radiation: quantum generation of coherent surface plasmons in nanosystems,” Phys. Rev. Lett. 90(2), 027402 (2003).
[Crossref] [PubMed]

I. De Leon and P. Berini, “Amplification of long-range surface plasmons by a dipolar gain medium,” Nat. Photonics 4(6), 382–387 (2010).
[Crossref]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J.-Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[Crossref] [PubMed]

T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “Surface plasmon polariton based modulators and switches operating at telecom wavelengths,” Appl. Phys. Lett. 85(24), 5833–5836 (2004).
[Crossref]

M. V. Ermolenko, O. V. Buganov, S. A. Tikhomirov, V. V. Stankevich, S. V. Gaponenko, and A. S. Shulenkov, “Ultrafast all-optical modulator for 1.5 μm controlled by Ti:Al2O3 laser,” Appl. Phys. Lett. 97(7), 073113 (2010).
[Crossref]

J. N. Caspers, N. Rotenberg, and H. M. van Driel, “Ultrafast silicon-based active plasmonics at telecom wavelengths,” Opt. Express 18(19), 19761–19769 (2010).
[Crossref] [PubMed]

K. J. Chau, S. E. Irvine, and A. Y. Elezzabi, “A gigahertz surface magneto-plasmon optical modulator,” IEEE J. Quantum Electron. 40(5), 571–579 (2004).
[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
[Crossref]

F. E. Doany, D. Grischkowsky, and C. C. Chi, “Carrier lifetime versus ion-implantation dose in silicon on sapphire,” Appl. Phys. Lett. 50(8), 460–462 (1987).
[Crossref]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

I. De Leon and P. Berini, “Amplification of long-range surface plasmons by a dipolar gain medium,” Nat. Photonics 4(6), 382–387 (2010).
[Crossref]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J.-Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[Crossref] [PubMed]

M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask prepared by electron beam lithography,” Microelectron. Eng. 88(8), 2338–2341 (2011).
[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref] [PubMed]

J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref] [PubMed]

F. E. Doany, D. Grischkowsky, and C. C. Chi, “Carrier lifetime versus ion-implantation dose in silicon on sapphire,” Appl. Phys. Lett. 50(8), 460–462 (1987).
[Crossref]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J.-Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[Crossref] [PubMed]

S. Sederberg, V. Van, and A. Y. Elezzabi, “Monolithic integration of plasmonic waveguides into a complimentary metal-oxide-semiconductor- and photonic-compatible platform,” Appl. Phys. Lett. 96(12), 121101 (2010).
[Crossref]

Z. Han, A. Y. Elezzabi, and V. Van, “Experimental realization of subwavelength plasmonic slot waveguides on a silicon platform,” Opt. Lett. 35(4), 502–504 (2010).
[Crossref] [PubMed]

A. Y. Elezzabi, Z. Han, S. Sederberg, and V. Van, “Ultrafast all-optical modulation in silicon-based nanoplasmonic devices,” Opt. Express 17(13), 11045–11056 (2009).
[Crossref] [PubMed]

K. J. Chau, S. E. Irvine, and A. Y. Elezzabi, “A gigahertz surface magneto-plasmon optical modulator,” IEEE J. Quantum Electron. 40(5), 571–579 (2004).
[Crossref]

M. V. Ermolenko, O. V. Buganov, S. A. Tikhomirov, V. V. Stankevich, S. V. Gaponenko, and A. S. Shulenkov, “Ultrafast all-optical modulator for 1.5 μm controlled by Ti:Al2O3 laser,” Appl. Phys. Lett. 97(7), 073113 (2010).
[Crossref]

M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask prepared by electron beam lithography,” Microelectron. Eng. 88(8), 2338–2341 (2011).
[Crossref]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
[Crossref]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

M. V. Ermolenko, O. V. Buganov, S. A. Tikhomirov, V. V. Stankevich, S. V. Gaponenko, and A. S. Shulenkov, “Ultrafast all-optical modulator for 1.5 μm controlled by Ti:Al2O3 laser,” Appl. Phys. Lett. 97(7), 073113 (2010).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

M. Ambati, S. H. Nam, E. Ulin-Avila, D. A. Genov, G. Bartal, and X. Zhang, “Observation of stimulated emission of surface plasmon polaritons,” Nano Lett. 8(11), 3998–4001 (2008).
[Crossref] [PubMed]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

F. E. Doany, D. Grischkowsky, and C. C. Chi, “Carrier lifetime versus ion-implantation dose in silicon on sapphire,” Appl. Phys. Lett. 50(8), 460–462 (1987).
[Crossref]

Z. Han, A. Y. Elezzabi, and V. Van, “Experimental realization of subwavelength plasmonic slot waveguides on a silicon platform,” Opt. Lett. 35(4), 502–504 (2010).
[Crossref] [PubMed]

A. Y. Elezzabi, Z. Han, S. Sederberg, and V. Van, “Ultrafast all-optical modulation in silicon-based nanoplasmonic devices,” Opt. Express 17(13), 11045–11056 (2009).
[Crossref] [PubMed]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

K. J. Chau, S. E. Irvine, and A. Y. Elezzabi, “A gigahertz surface magneto-plasmon optical modulator,” IEEE J. Quantum Electron. 40(5), 571–579 (2004).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

A. V. Krasavin and A. V. Zayats, “Electro-optic switching element for dielectric-loaded surface plasmon polariton waveguides,” Appl. Phys. Lett. 97(4), 041107 (2010).
[Crossref]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration,” Opt. Express 19(9), 8888–8902 (2011).
[Crossref] [PubMed]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Fully complimentary metal-oxide-semiconductor compatible nanoplasmonic slot waveguides for silicon electronic photonic integrated circuits,” Appl. Phys. Lett. 98(2), 021107 (2011).
[Crossref]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J.-Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440(7083), 508–511 (2006).
[Crossref] [PubMed]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “Surface plasmon polariton based modulators and switches operating at telecom wavelengths,” Appl. Phys. Lett. 85(24), 5833–5836 (2004).
[Crossref]

Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[Crossref] [PubMed]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Fully complimentary metal-oxide-semiconductor compatible nanoplasmonic slot waveguides for silicon electronic photonic integrated circuits,” Appl. Phys. Lett. 98(2), 021107 (2011).
[Crossref]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration,” Opt. Express 19(9), 8888–8902 (2011).
[Crossref] [PubMed]

B. E. Little, S. T. Chu, H. A. Haus, J. Foresi, and J.-P. Laine, “Microring resonator channel dropping filters,” J. Lightwave Technol. 15(6), 998–1005 (1997).
[Crossref]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration,” Opt. Express 19(9), 8888–8902 (2011).
[Crossref] [PubMed]

S. Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, “Fully complimentary metal-oxide-semiconductor compatible nanoplasmonic slot waveguides for silicon electronic photonic integrated circuits,” Appl. Phys. Lett. 98(2), 021107 (2011).
[Crossref]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
[Crossref]

K. F. MacDonald, Z. L. Sámson, M. I. Stockman, and N. I. Zheludev, “Ultrafast active plasmonics,” Nat. Photonics 3(1), 55–58 (2009).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

J. Gosciniak, S. I. Bozhevolnyi, T. B. Andersen, V. S. Volkov, J. Kjelstrup-Hansen, L. Markey, and A. Dereux, “Thermo-optic control of dielectric-loaded plasmonic waveguide components,” Opt. Express 18(2), 1207–1216 (2010).
[Crossref] [PubMed]

M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask prepared by electron beam lithography,” Microelectron. Eng. 88(8), 2338–2341 (2011).
[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

M. Ambati, S. H. Nam, E. Ulin-Avila, D. A. Genov, G. Bartal, and X. Zhang, “Observation of stimulated emission of surface plasmon polaritons,” Nano Lett. 8(11), 3998–4001 (2008).
[Crossref] [PubMed]

T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “Surface plasmon polariton based modulators and switches operating at telecom wavelengths,” Appl. Phys. Lett. 85(24), 5833–5836 (2004).
[Crossref]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

M. T. Hill, M. Marell, E. S. P. Leong, B. Smalbrugge, Y. Zhu, M. Sun, P. J. van Veldhoven, E. J. Geluk, F. Karouta, Y.-S. Oei, R. Nötzel, C.-Z. Ning, and M. K. Smit, “Lasing in metal-insulator-metal sub-wavelength plasmonic waveguides,” Opt. Express 17(13), 11107–11112 (2009).
[Crossref] [PubMed]

E. Ozbay, “Plasmonics: merging photonics and electronics at nanoscale dimensions,” Science 311(5758), 189–193 (2006).
[Crossref] [PubMed]

P. A. Schumann and R. P. Phillips, “Comparison of classical approximations to free carrier absorption in semiconductors,” Solid-State Electron. 10(9), 943–948 (1967).
[Crossref]

Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[Crossref] [PubMed]

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Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
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Z. Han, A. Y. Elezzabi, and V. Van, “Experimental realization of subwavelength plasmonic slot waveguides on a silicon platform,” Opt. Lett. 35(4), 502–504 (2010).
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Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[Crossref] [PubMed]

Y. Feng, M. Feser, A. Lyon, S. Rishton, X. Zeng, S. Chen, S. Sassolini, and W. Yun, “Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications,” J. Vac. Sci. Technol. B 25(6), 2004 (2007).
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[Crossref]

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[Crossref]

S. Sederberg, V. Van, and A. Y. Elezzabi, “Monolithic integration of plasmonic waveguides into a complimentary metal-oxide-semiconductor- and photonic-compatible platform,” Appl. Phys. Lett. 96(12), 121101 (2010).
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[Crossref]

M. A. Mohammad, T. Fito, J. Chen, M. Aktary, M. Stepanova, and S. K. Dew, “Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate,” J. Vac. Sci. Technol. B 28(1), L1 (2010).
[Crossref]

M. A. Mohammad, S. K. Dew, S. Evoy, and M. Stepanova, “Fabrication of sub-10 nm silicon carbon nitride resonators using a hydrogen silsesquioxane mask prepared by electron beam lithography,” Microelectron. Eng. 88(8), 2338–2341 (2011).
[Crossref]

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[Crossref] [PubMed]

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[Crossref] [PubMed]

J. N. Caspers, N. Rotenberg, and H. M. van Driel, “Ultrafast silicon-based active plasmonics at telecom wavelengths,” Opt. Express 18(19), 19761–19769 (2010).
[Crossref] [PubMed]

Y. Song, J. Wang, Q. Li, M. Yan, and M. Qiu, “Broadband coupler between silicon waveguide and hybrid plasmonic waveguide,” Opt. Express 18(12), 13173–13179 (2010).
[Crossref] [PubMed]

Z. Han, A. Y. Elezzabi, and V. Van, “Experimental realization of subwavelength plasmonic slot waveguides on a silicon platform,” Opt. Lett. 35(4), 502–504 (2010).
[Crossref] [PubMed]

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