Abstract

We present a general algorithm for combining measurements taken under various illumination and imaging conditions to quantitatively extract the amplitude and phase of an object wave. The algorithm uses the weak object transfer function, which incorporates arbitrary pupil functions and partially coherent illumination. The approach is extended beyond the weak object regime using an iterative algorithm. We demonstrate the method on measurements of Extreme Ultraviolet Lithography (EUV) multilayer mask defects taken in an EUV zone plate microscope with both a standard zone plate lens and a zone plate implementing Zernike phase contrast.

© 2015 Optical Society of America

Full Article  |  PDF Article
More Like This
Quantitative phase microscopy via optimized inversion of the phase optical transfer function

Micah H. Jenkins and Thomas K. Gaylord
Appl. Opt. 54(28) 8566-8579 (2015)

Pupil-aberration calibration with controlled illumination for quantitative phase imaging

YoonSeok Baek, Hervé Hugonnet, and YongKeun Park
Opt. Express 29(14) 22127-22135 (2021)

Efficient quantitative phase microscopy using programmable annular LED illumination

Jiaji Li, Qian Chen, Jialin Zhang, Yan Zhang, Linpeng Lu, and Chao Zuo
Biomed. Opt. Express 8(10) 4687-4705 (2017)

View More...

References

  • View by:
  • Article Order
  • Year
  • Author
  • Publication
  1. H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
    [Crossref]
  2. R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
    [Crossref]
  3. A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
    [Crossref]
  4. M. Reed Teague, “Deterministic phase retrieval: a Greens function solution,” J. Opt. Soc. Am. 73, 1434 (1983).
    [Crossref]
  5. J. R. Fienup, “Phase retrieval algorithms: a comparison,” Appl. Opt. 21, 2758–2769 (1982).
    [Crossref] [PubMed]
  6. Z. Wang, L. Millet, M. Mir, H. Ding, S. Unarunotai, J. Rogers, M. U. Gillette, and G. Popescu, “Spatial light interference microscopy (SLIM),” Opt. Express 19, 1016–1026 (2011).
    [Crossref] [PubMed]
  7. C. Falldorf, M. Agour, C. v. Kopylow, and R. B. Bergmann, “Phase retrieval by means of a spatial light modulator in the Fourier domain of an imaging system,” Appl. Opt. 49, 1826–1830 (2010).
    [Crossref] [PubMed]
  8. R. Sheppard and D. K. Hamilton, “Differential phase contrast in scanning optical microscopy,” J. Microsc. 133, 27–39 (1984).
    [Crossref]
  9. G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
    [Crossref]
  10. S. B. Mehta and C. J. R. Sheppard, “Partially coherent image formation in Asymmetric Illumination-based Differential Phase Contrast (AIDPC) and phase-retrieval,” AIP Conference Proceedings1236, 289–294 (2010).
  11. L. Tian and L. Waller, “Quantitative differential phase contrast imaging in an LED array microscope,” Opt. Express 23, 11394–11403 (2015).
    [Crossref] [PubMed]
  12. L. Waller, S. S. Kou, C. J. R. Sheppard, and G. Barbastathis, “Phase from chromatic aberrations,” Opt. Express 18, 22817–22825 (2010).
    [Crossref] [PubMed]
  13. J. H. Seldin and J. R. Fienup, “Iterative blind deconvolution algorithm applied to phase retrieval,” J. Opt. Soc. Am. A 7, 428–433 (1990).
    [Crossref]
  14. R. W. Gerchberg and W. O. Saxton, “A practical algorithm for the determination of phase from image and diffraction plane pictures,” Optik 35, 237–250 (1972).
  15. R. G. Paxman, T. J. Schulz, and J. R. Fienup, “Joint estimation of object and aberrations by using phase diversity,” J. Opt. Soc. Am. A 9, 1072 (1992).
    [Crossref]
  16. B. H. Dean and C. W. Bowers, “Diversity selection for phase-diverse phase retrieval,” J. Opt. Soc. Am. A 20, 1490 (2003).
    [Crossref]
  17. L. Waller, M. Tsang, S. Ponda, S. Y. Yang, and G. Barbastathis, “Phase and amplitude imaging from noisy images by Kalman filtering,” Opt. Express 19, 2805–2814 (2011).
    [Crossref] [PubMed]
  18. J. C. Petruccelli, L. Tian, and G. Barbastathis, “The transport of intensity equation for optical path length recovery using partially coherent illumination,” Opt. Express 21, 14430–14441 (2013).
    [Crossref] [PubMed]
  19. Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.
  20. A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
    [Crossref] [PubMed]
  21. P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
    [Crossref]
  22. C. J. R. Sheppard, “Defocused transfer function for a partially coherent microscope and application to phase retrieval,” J. Opt. Soc. Am. A 21, 828–831 (2004).
    [Crossref]
  23. J. P. Guigay, M. Langer, R. Boistel, and P. Cloetens, “Mixed transfer function and transport of intensity approach for phase retrieval in the Fresnel region,” Opt. Lett. 32, 1617 (2007).
    [Crossref] [PubMed]
  24. T. E. Gureyev, T. J. Davis, A. Pogany, S. C. Mayo, and S. W. Wilkins, “Optical phase retrieval by use of first Born- and Rytov-type approximations,” Appl. Opt. 43, 2418–2430 (2004).
    [Crossref] [PubMed]
  25. S. S. Kou, L. Waller, G. Barbastathis, P. Marquet, C. Depeursinge, and C. J. R. Sheppard, “Quantitative phase restoration by direct inversion using the optical transfer function,” Opt. Lett. 36, 2671–2673 (2011).
    [Crossref] [PubMed]
  26. S. B. Mehta and C. J. Sheppard, “Transfer Function Analysis of Partially Coherent Phase Imaging Methods and Evaluation for Quantitative Imaging,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2009).
  27. R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
    [Crossref]
  28. R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
    [Crossref]
  29. R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
    [Crossref]
  30. K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
    [Crossref]
  31. H. H. Hopkins, “On the Diffraction Theory of Optical Images,” Proceedings of the Royal Society of London A: Mathematical, Physical and Engineering Sciences217, 408–432 (1953).
  32. C. Chang, A. Sakdinawat, P. Fischer, E. Anderson, and D. Attwood, “Single-element objective lens for soft x-ray differential interference contrast microscopy,” Opt. Lett. 31, 1564–1566 (2006).
    [Crossref] [PubMed]
  33. F. Zernike, “Phase contrast, a new method for the microscopic observation of transparent objects,” Physica 9, 686–698 (1942).
    [Crossref]
  34. Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).
  35. Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).
  36. Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).
  37. M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

2015 (2)

L. Tian and L. Waller, “Quantitative differential phase contrast imaging in an LED array microscope,” Opt. Express 23, 11394–11403 (2015).
[Crossref] [PubMed]

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

2014 (1)

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

2013 (4)

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
[Crossref]

J. C. Petruccelli, L. Tian, and G. Barbastathis, “The transport of intensity equation for optical path length recovery using partially coherent illumination,” Opt. Express 21, 14430–14441 (2013).
[Crossref] [PubMed]

2011 (5)

2010 (2)

2009 (1)

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

2007 (1)

2006 (2)

C. Chang, A. Sakdinawat, P. Fischer, E. Anderson, and D. Attwood, “Single-element objective lens for soft x-ray differential interference contrast microscopy,” Opt. Lett. 31, 1564–1566 (2006).
[Crossref] [PubMed]

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

2004 (2)

2003 (1)

1999 (1)

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

1992 (1)

1990 (1)

1984 (1)

R. Sheppard and D. K. Hamilton, “Differential phase contrast in scanning optical microscopy,” J. Microsc. 133, 27–39 (1984).
[Crossref]

1983 (1)

1982 (1)

1972 (1)

R. W. Gerchberg and W. O. Saxton, “A practical algorithm for the determination of phase from image and diffraction plane pictures,” Optik 35, 237–250 (1972).

1942 (1)

F. Zernike, “Phase contrast, a new method for the microscopic observation of transparent objects,” Physica 9, 686–698 (1942).
[Crossref]

Acome, E.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Agour, M.

Allen, L. J.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Allezy, A. P.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Anderson, E.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

C. Chang, A. Sakdinawat, P. Fischer, E. Anderson, and D. Attwood, “Single-element objective lens for soft x-ray differential interference contrast microscopy,” Opt. Lett. 31, 1564–1566 (2006).
[Crossref] [PubMed]

Attwood, D.

Barbastathis, G.

Baruchel, J.

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Benk, M.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

Benk, M. P.

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Bergmann, R. B.

Boistel, R.

Bowers, C. W.

Bret, T.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

Chang, C.

Chao, W.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Chao, W. L.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Chen, F.-R.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Claus, R. A.

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.

Cloetens, P.

J. P. Guigay, M. Langer, R. Boistel, and P. Cloetens, “Mixed transfer function and transport of intensity approach for phase retrieval in the Fresnel region,” Opt. Lett. 32, 1617 (2007).
[Crossref] [PubMed]

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Cordes, A.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Cork, C. W.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Cork, W.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Dauwels, J.

Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.

Davis, T. J.

Dean, B. H.

Delano, R.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Depeursinge, C.

DePonte, J. C.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Dickinson, M. R.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Ding, H.

Donoghue, A.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

Donoghue, A. P.

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Edinger, K.

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

Falldorf, C.

Fienup, J. R.

Findlay, S. D.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Fischer, P.

Gamsby, J. F.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Gao, W.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

Garetto, A.

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

Gerchberg, R. W.

R. W. Gerchberg and W. O. Saxton, “A practical algorithm for the determination of phase from image and diffraction plane pictures,” Optik 35, 237–250 (1972).

Ghiorso, W. B.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Gillette, M. U.

Goldberg, K.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

Goldberg, K. A.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Guigay, J. P.

J. P. Guigay, M. Langer, R. Boistel, and P. Cloetens, “Mixed transfer function and transport of intensity approach for phase retrieval in the Fresnel region,” Opt. Lett. 32, 1617 (2007).
[Crossref] [PubMed]

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Gullikson, E. M.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Gureyev, T. E.

Hamilton, D. K.

R. Sheppard and D. K. Hamilton, “Differential phase contrast in scanning optical microscopy,” J. Microsc. 133, 27–39 (1984).
[Crossref]

Harris-Jones, J.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Hopkins, H. H.

H. H. Hopkins, “On the Diffraction Theory of Optical Images,” Proceedings of the Royal Society of London A: Mathematical, Physical and Engineering Sciences217, 408–432 (1953).

Horstmeyer, R.

G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
[Crossref]

Hsieh, W.-K.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Huang, H.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Jingshan, Z.

Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.

Johnson, D.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

Johnson, D. G.

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Jonckheere, R.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

Jones, M. S. G.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Kai, J.-J.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Kinoshita, H.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Kopylow, C. v.

Kou, S. S.

Kwon, H. J.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Langer, M.

Liang, T.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Ludwig, W.

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Macdougall, J. B.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Magana, J.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

Marquet, P.

Martin, A. V.

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Martin, E.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Mayo, S. C.

Mehta, S. B.

S. B. Mehta and C. J. Sheppard, “Transfer Function Analysis of Partially Coherent Phase Imaging Methods and Evaluation for Quantitative Imaging,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2009).

S. B. Mehta and C. J. R. Sheppard, “Partially coherent image formation in Asymmetric Illumination-based Differential Phase Contrast (AIDPC) and phase-retrieval,” AIP Conference Proceedings1236, 289–294 (2010).

Milanovic, V.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Millet, L.

Mir, M.

Miyakawa, R.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

Miyakawa, R. H.

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

Mochi, I.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Nakajima, T.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Naulleau, P.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

Naulleau, P. P.

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

Neureuther, A.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

Neureuther, A. R.

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

Oster, J.

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

Paxman, R. G.

Petruccelli, J. C.

Pogany, A.

Ponda, S.

Popescu, G.

Reed Teague, M.

Rekawa, S. B.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Rogers, J.

Sakdinawat, A.

Salmassi, F.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Saxton, W. O.

R. W. Gerchberg and W. O. Saxton, “A practical algorithm for the determination of phase from image and diffraction plane pictures,” Optik 35, 237–250 (1972).

Schlenker, M.

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Schulz, T. J.

Seldin, J. H.

Sheppard, C. J.

S. B. Mehta and C. J. Sheppard, “Transfer Function Analysis of Partially Coherent Phase Imaging Methods and Evaluation for Quantitative Imaging,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2009).

Sheppard, C. J. R.

Sheppard, R.

R. Sheppard and D. K. Hamilton, “Differential phase contrast in scanning optical microscopy,” J. Microsc. 133, 27–39 (1984).
[Crossref]

Teki, R.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Tian, L.

Tsang, M.

Unarunotai, S.

Van Camp, D.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Van den Heuvel, D.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

Van Dyck, D.

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Van Every, E.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Van Landuyt, J.

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

Vytla, V. K.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Waiblinger, M.

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

Waller, L.

L. Tian and L. Waller, “Quantitative differential phase contrast imaging in an LED array microscope,” Opt. Express 23, 11394–11403 (2015).
[Crossref] [PubMed]

L. Waller, M. Tsang, S. Ponda, S. Y. Yang, and G. Barbastathis, “Phase and amplitude imaging from noisy images by Kalman filtering,” Opt. Express 19, 2805–2814 (2011).
[Crossref] [PubMed]

S. S. Kou, L. Waller, G. Barbastathis, P. Marquet, C. Depeursinge, and C. J. R. Sheppard, “Quantitative phase restoration by direct inversion using the optical transfer function,” Opt. Lett. 36, 2671–2673 (2011).
[Crossref] [PubMed]

L. Waller, S. S. Kou, C. J. R. Sheppard, and G. Barbastathis, “Phase from chromatic aberrations,” Opt. Express 18, 22817–22825 (2010).
[Crossref] [PubMed]

Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

Wang, Y.-G.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

Wang, Z.

Wilkins, S. W.

Wojdyla, A.

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

Yamaguchi, Y.

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

Yang, C.

G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
[Crossref]

Yang, S. Y.

Zehm, D.

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Zernike, F.

F. Zernike, “Phase contrast, a new method for the microscopic observation of transparent objects,” Physica 9, 686–698 (1942).
[Crossref]

Zheng, G.

G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
[Crossref]

Appl. Opt. (3)

Appl. Phys. Lett. (1)

P. Cloetens, W. Ludwig, J. Baruchel, D. Van Dyck, J. Van Landuyt, J. P. Guigay, and M. Schlenker, “Holotomography: Quantitative phase tomography with micrometer resolution using hard synchrotron radiation x rays,” Appl. Phys. Lett. 75, 2912 (1999).
[Crossref]

J. Microsc. (1)

R. Sheppard and D. K. Hamilton, “Differential phase contrast in scanning optical microscopy,” J. Microsc. 133, 27–39 (1984).
[Crossref]

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (4)

Nat. Photon. (1)

G. Zheng, R. Horstmeyer, and C. Yang, “Wide-field, high-resolution Fourier ptychographic microscopy,” Nat. Photon. 7, 739–745 (2013).
[Crossref]

Opt. Express (5)

Opt. Lett. (3)

Optik (1)

R. W. Gerchberg and W. O. Saxton, “A practical algorithm for the determination of phase from image and diffraction plane pictures,” Optik 35, 237–250 (1972).

Physica (1)

F. Zernike, “Phase contrast, a new method for the microscopic observation of transparent objects,” Physica 9, 686–698 (1942).
[Crossref]

Proc. SPIE (7)

Y.-G. Wang, R. Miyakawa, W. Chao, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” Proc. SPIE 9235, 92350L (2014).

K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. G. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, “Commissioning an EUV mask microscope for lithography generations reaching 8 nm,” Proc. SPIE 8679, 867919 (2013).
[Crossref]

Y.-G. Wang, R. Miyakawa, W. Chao, M. Benk, A. Wojdyla, A. Donoghue, D. Johnson, K. Goldberg, A. Neureuther, T. Liang, and P. Naulleau, “Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection,” Proc. SPIE 9422, 94221C (2015).

R. A. Claus, I. Mochi, M. P. Benk, K. A. Goldberg, A. R. Neureuther, and P. P. Naulleau, “Recovering effective amplitude and phase roughness of EUV masks,” Proc. SPIE 8880, 88802B (2013).
[Crossref]

H. J. Kwon, J. Harris-Jones, R. Teki, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, “Printability of Native Blank Defects and Programmed Defects and Their Stack Structures,” Proc. SPIE 8166, 81660H (2011).
[Crossref]

R. Jonckheere, T. Bret, D. Van den Heuvel, J. Magana, W. Gao, and M. Waiblinger, “Repair of natural EUV reticle defects,” Proc. SPIE 8166, 81661G (2011).
[Crossref]

A. Garetto, J. Oster, M. Waiblinger, and K. Edinger, “Challenging defect repair techniques for maximizing mask repair yield,” Proc. SPIE 7488, 74880H (2009).
[Crossref]

Ultramicroscopy (1)

A. V. Martin, F.-R. Chen, W.-K. Hsieh, J.-J. Kai, S. D. Findlay, and L. J. Allen, “Spatial incoherence in phase retrieval based on focus variation,” Ultramicroscopy 106, 914–924 (2006).
[Crossref] [PubMed]

Other (8)

R. A. Claus, Y.-G. Wang, A. Wojdyla, M. P. Benk, K. A. Goldberg, A. R. Neureuther, P. P. Naulleau, and L. Waller, “Phase measurements of EUV mask defects,” Proc. SPIE9422, 942217 (2015).
[Crossref]

R. A. Claus, Y.-G. Wang, M. Benk, K. A. Goldberg, P. Naulleau, A. Neureuther, and L. Waller, “Partially Coherent Quantitative Phase Retrieval for EUV Lithography,” in “Imaging and Applied Optics 2015,” (OSA, 2015), p. ITH2A.4.
[Crossref]

S. B. Mehta and C. J. Sheppard, “Transfer Function Analysis of Partially Coherent Phase Imaging Methods and Evaluation for Quantitative Imaging,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2009).

M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, and K. A. Goldberg, “A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope,” Proc. SPIE9235, 92350K (2014).

H. H. Hopkins, “On the Diffraction Theory of Optical Images,” Proceedings of the Royal Society of London A: Mathematical, Physical and Engineering Sciences217, 408–432 (1953).

Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, “Phase-enhanced defect sensitivity for EUV mask inspection,” 2014 International Symposium on Extreme Ultraviolet Lithography, Washington DC, USA (2014).

S. B. Mehta and C. J. R. Sheppard, “Partially coherent image formation in Asymmetric Illumination-based Differential Phase Contrast (AIDPC) and phase-retrieval,” AIP Conference Proceedings1236, 289–294 (2010).

Z. Jingshan, L. Tian, R. A. Claus, J. Dauwels, and L. Waller, “Partially Coherent Phase Recovery by Kalman Filtering,” in “Frontiers in Optics 2013 Postdeadline,” (OSA, 2013), p. FW6A.9.

Cited By

Optica participates in Crossref's Cited-By Linking service. Citing articles from Optica Publishing Group journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (3)
Fig. 1
Fig. 1 Iterative algorithm simulation for an object that does not obey the weak object approximation. A focus stack of 7 images, evenly spaced in the interval 1.7λ/NA2, were generated with partial coherence σ = 0.25. A defocused image (−1.7±λ/NA2) is shown over a few iterations to illustrate the iterative correction. After one iteration, some error in the recovered phase and amplitude remains, but is mostly removed by the second iteration. The color scale of Is is offset by 1 to match that of I and Ia.

Download Full Size | PPT Slide | PDF

Fig. 2
Fig. 2 Sample measurements taken using the standard zone plate (top) and phase contrast zone plate (bottom). The defocus distance is indicated at the top, along with the real and imaginary transfer functions in frequency space for each image, with the NA marked by a dashed circle. The illumination is a disk source with σ = 0.25.

Download Full Size | PPT Slide | PDF

Fig. 3
Fig. 3 The recovered phase in degrees (top) and amplitude (bottom) are shown for the standard zone plate and phase contrast zone plate. The differences between the two estimates of the field are shown on the right, with an arbitrary offset.

Download Full Size | PPT Slide | PDF

Equations (10)

Equations on this page are rendered with MathJax. Learn more.

I = ∫ | ∫ E ( x ′ ) e i f ′ ⋅ x ′ P ( x − x ′ ) d x ′ | 2 J ˜ ( f ′ ) d f ′ .
I = ∫ | [ ( 1 + E r e + i E i m ) ⋅ e i f ′ ⋅ x ] * P | 2 J ˜ ( f ′ ) d f ′ .
I ˜ = ∫ [ ( δ ( f − f ′ ) ⋅ P ˜ ( f ) + E r e ˜ ( f − f ′ ) ⋅ P ˜ ( f ) + i E i m ˜ ( f − f ′ ) ⋅ P ˜ ( f ) ) * ( δ ( f + f ′ ) ⋅ P ˜ * ( f ) + E r e ˜ ( f + f ′ ) ⋅ P ˜ * ( f ) − i E i m ˜ ( f + f ′ ) ⋅ P ˜ * ( f ) ) ] ⋅ J ˜ ( f ′ ) d f ′ ,
I ˜ = I 0 ˜ + I s ˜ + ∫ ( J ˜ ( f ′ ) ⋅ P ˜ ( f ′ ) ) * ( E r e ˜ ( f ) ⋅ P ˜ * ( f − f ′ ) − i E i m ˜ ( f ) ⋅ P ˜ * ( f − f ′ ) ) d f ′ + ∫ ( E r e ˜ ( f ) ⋅ P ˜ ( f + f ′ ) + i E i m ˜ ( f ) ⋅ P ˜ ( f + f ′ ) ) * ( J ˜ ( f ′ ) ⋅ P ˜ * ( f ′ ) ) d f ′ ,
I ˜ = I 0 ˜ + E r e ˜ ⋅ K r e ˜ + E i m ˜ ⋅ K i m ˜ + I s ˜ ,
K r e ˜ = ( P ˜ ⋅ J ˜ ) ★ P ˜ + P ˜ ★ ( P ˜ ⋅ J ˜ )
K i m ˜ = ( P ˜ ⋅ J ˜ ) ★ P ˜ − P ˜ ★ ( P ˜ ⋅ J ˜ ) .
I ˜ ≈ I 0 ˜ + E r e ˜ ⋅ K r e ˜ + E i m ˜ ⋅ K i m ˜
I ˜ ≈ I 0 ˜ + E r e * K r e + E i m * K i m .
[ I 1 ˜ ( f i ) ⋮ I n ˜ ( f i ) ] = [ K r e 1 ˜ ( f i ) ⋮ K r e n ˜ ( f i ) K i m 1 ˜ ( f i ) ⋮ K i m n ˜ ( f i ) ] [ E r e ˜ ( f i ) E i m ˜ ( f i ) ] ,

Metrics