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Production and characterization of Ti:sapphire thin films grown by reactive laser ablation with elemental precursors

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Abstract

Crystalline Ti:sapphire Ti:Al2O3 thin films were grown at low temperatures upon Al2O3 (0001) substrates by reactive crossed-beam laser ablation at 248 nm by use of a liquid Ti–Al alloy target and O2. The films were investigated ex situ by x-ray diffraction, x-ray photoelectron spectroscopy, and Rutherford backscattering spectrometry. Low-temperature luminescence was identical to that for Ti3+ ions in bulk samples of Al2O3.

© 1999 Optical Society of America

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