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Extreme-ultraviolet harmonic generation near 13 nm with a two-color elliptically polarized laser field

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Abstract

Theoretical results for high-harmonic generation by a two-color elliptically polarized laser field are presented. Special emphasis is placed on coherent radiation near 13 nm in connection with the development of extreme-ultraviolet lithography. Linearly polarized radiation at this wavelength can be obtained with a linearly polarized bichromatic laser field, whereas circularly polarized radiation can be generated with a bichromatic circularly polarized field with counterrotating coplanar components. In both cases the harmonic emission efficiencies at the saturation intensity are more than 1 order of magnitude larger than for harmonic generation with a monochromatic linearly polarized field.

© 2000 Optical Society of America

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