Abstract

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.

© 1990 Optical Society of America

Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation

H. Andersson, Mats Ekberg, Sverker Hård, Stellan Jacobsson, Michael Larsson, and T. Nilsson
Appl. Opt. 29(28) 4259-4267 (1990)

Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography

M. Ekberg, F. Nikolajeff, M. Larsson, and S. Hård
Appl. Opt. 33(1) 103-107 (1994)

Computer-generated holograms fabricated by direct write of positive electron-beam resist

Kristopher S. Urquhart, Robert Stein, and Sing H. Lee
Opt. Lett. 18(4) 308-310 (1993)

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson, Mats Ekberg, Fredrik Nikolajeff, and Sverker Hård
Appl. Opt. 33(7) 1176-1179 (1994)

Experiments on annealed binary phase only filters fabricated with electron beam lithography

Myung Soo Kim and Clark C. Guest
Appl. Opt. 29(23) 3380-3386 (1990)