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Increasing resistivity effects in field-assisted ion exchange for planar optical waveguide fabrication

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Abstract

An improved description of the usual field-assisted ion-exchange processes for fabricating planar surface optical waveguides in glass substrates is presented that takes into account both increased resistivity because of incoming ions and the substrate's finite thickness. Time dependencies of the ion flux density, effective depth, and profile shape are predicted.

© 1996 Optical Society of America

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