Abstract
Achieving a uniform fan-out energy distribution is critical to the successful applications of substrate guided-wave optical interconnects. Using Dupont photopolymer film HRF-600X001-20, we investigated the optimum recording beam intensity for obtaining a large dynamic region of diffraction efficiency relative to exposure dosage. Based on the experimental diffraction efficiency curve, 1-to-5 and 1-to-9 surface-normal fan-out devices were fabricated that operated at a wavelength of 850 nm, and output nonuniformities of % and % were obtained for the two devices.
© 1997 Optical Society of America
Full Article | PDF ArticleMore Like This
K. Thilo Weitzel, Urs P. Wild, Viktor N. Mikhailov, and Vitaly N. Krylov
Opt. Lett. 22(24) 1899-1901 (1997)
Zhenhai Fu, Richard Li, and Ray T. Chen
Opt. Lett. 23(7) 522-524 (1998)
Chunhe Zhao and Ray T. Chen
Appl. Opt. 36(12) 2537-2544 (1997)