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Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

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Abstract

We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to 4 (mJ/cm2)/pulse and pulse counts in excess of 109. The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.

© 1999 Optical Society of America

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