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Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F2 and KrF excimer lasers

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Abstract

Novel materials processing by a multiwavelength excitation process using F2 and KrF excimer lasers for high-efficiency and high-speed refractive-index modification of fused silica is demonstrated. We find this process to be essentially superior to single-wavelength F2-laser processing: The multiwavelength excitation process achieves more than twice the diffraction efficiency of fused silica modified by a F2 laser at the same total number of photons in each irradiated laser beam supplied to the fused-silica substrate. This superiority is attributed to a resonance-photoionization-like process based on excited-state absorption.

© 2002 Optical Society of America

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