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Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method

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Abstract

ZrO2 films are deposited by the electron-beam evaporation method. Parts of the prepared samples are posttreated with oxygen plasma at the environment temperature. The laser-induced damage threshold (LIDT) of the films increases from 15.9 to 23.1 J/cm2 after treatment with oxygen plasma. Compared with that of the as-grown samples, significant reduction of the average microdefect density and absorption are found after oxygen-plasma posttreatment. These results indicate that the oxygen-plasma posttreatment technique is an effective and simple method for reducing the microdefect density and absorption to improve the LIDT.

© 2004 Optical Society of America

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