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Visible and near-infrared responsivity of femtosecond-laser microstructured silicon photodiodes

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Abstract

We investigated the current–voltage characteristics and responsivity of photodiodes fabricated with silicon that was microstructured by use of femtosecond-laser pulses in a sulfur-containing atmosphere. The photodiodes that we fabricated have a broad spectral response ranging from the visible to the near infrared (4001600nm). The responsivity depends on substrate doping, microstructuring fluence, and annealing temperature. We obtained room-temperature responsivities as high as 100AW at 1064nm, 2 orders of magnitude higher than for standard silicon photodiodes. For wavelengths below the bandgap we obtained responsivities as high as 50mAW at 1330nm and 35mAW at 1550nm.

© 2005 Optical Society of America

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