Abstract

The optical near field and its polarization anisotropy in transparent nanostructures were studied by polarization near-field optical microscopy. From experimental results and finite-difference time-domain calculations, we conclude that localized optical near fields exist at topographically higher regions of nanostructures under the TE-polarization condition. Optical near fields with a feature size smaller than $100\mathrm{nm}$ are applied for contact photomask lithography. We demonstrate photolithographic patterns with $80\mathrm{nm}$ width by using a $442\mathrm{nm}$ helium cadmium laser.

© 2006 Optical Society of America

Polarization-dependent Talbot effect

Yunqing Lu, Changhe Zhou, Shunquan Wang, and Bo Wang
J. Opt. Soc. Am. A 23(9) 2154-2160 (2006)

Focusing subwavelength light by using nanoholes in a transparent thin film

Pei-Kuen Wei, Wei-Lun Chang, Kunag-Li Lee, and En-Hong Lin
Opt. Lett. 34(12) 1867-1869 (2009)

Sub-diffraction-limited interference photolithography with metamaterials

Ting Xu, Yanhui Zhao, Junxian Ma, Changtao Wang, Jianhua Cui, Chunlei Du, and Xiangang Luo
Opt. Express 16(18) 13579-13584 (2008)

Investigating the characteristics of TM-pass/TE-stop polarizer designed using plasmonic nanostructures

Amr M. Mahros, Marwa M. Tharwat, and Islam Ashry
Appl. Opt. 54(14) 4464-4470 (2015)

Contrast in the evanescent near field of λ/20 period gratings for photolithography

Sharee J. McNab and Richard J. Blaikie
Appl. Opt. 39(1) 20-25 (2000)