Abstract
Ultraviolet excitation of a photosensitive Ti alkoxide solution was found to generate a metal-oxide-based insoluble film on substrates in contact with the solution during illumination. Patterned deposition of wide lines of material was demonstrated using a slit-shaped aluminum shadow mask during exposure. Stylus profilometry confirmed that the average thickness of the photodeposited film monotonically varied with accumulated UV fluence, exhibiting thicknesses of 10 to for fluences of 12 and , respectively. Moreover, the surface profile of the film surface at fluences greater than was found to reproduce the near-field Fresnel diffraction pattern anticipated from the slit mask used.
© 2008 Optical Society of America
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