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Wide-field optical nanoprofilometry using structured illumination

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Abstract

We combine the differential height measurement concept with structured illumination microscopy to develop wide-field optical nanoprofilometry. Sub-diffraction-limit lateral resolution and axially sectioning imaging are achieved with structured illumination using a liquid-crystal spatial light modulator. As the sample surface is placed into the linear region of the sectioning axial response curve, the signal change owing to topographic variations provides nanometer depth sensitivity. The lateral resolution and the depth profiling accuracy are about 0.3 wavelengths and 6 nm, respectively. Depth profiling on solid-state specimens and label-free superresolution imaging of living cells are demonstrated.

© 2009 Optical Society of America

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