Abstract

Three-dimensional (3D) direct laser writing commonly uses near-infrared femtosecond laser pulses. Here, we use a quasi-cw blue diode laser at a 405 nm wavelength. As prerequisite, we identify photoresist systems that unambiguously show nonlinear multiphoton polymerization at this excitation wavelength. Next, we obtain a diffraction-limited focus with a high-numerical-aperture objective lens ($\mathrm{NA}=1.4$), which is crucial to actually benefit from the wavelength advantage. To evaluate the anticipated reduced linewidths and improved resolution, we fabricate and characterize 2D and 3D benchmark structures. Finally, we also demonstrate dip-in direct laser writing with our setup.

© 2014 Optical Society of America

Multi-scale laser direct writing of conductive metal microstructures using a 405-nm blue laser

Takuma Komori, Taichi Furukawa, Motoyuki Iijima, and Shoji Maruo
Opt. Express 28(6) 8363-8370 (2020)

Low-loss modified SU-8 waveguides by direct laser writing at 405 nm

Jhonattan C. Ramirez, Juliana N. Schianti, Maria G. Almeida, Aristides Pavani, Roberto R. Panepucci, Hugo E. Hernandez-Figueroa, and Lucas H. Gabrielli
Opt. Mater. Express 7(7) 2651-2659 (2017)

3D-2D-3D photonic crystal heterostructures fabricated by direct laser writing

M. Deubel, M. Wegener, S. Linden, G. von Freymann, and S. John
Opt. Lett. 31(6) 805-807 (2006)

Three-dimensional direct laser writing inspired by stimulated-emission-depletion microscopy [Invited]

Joachim Fischer and Martin Wegener
Opt. Mater. Express 1(4) 614-624 (2011)

Three-dimensional multi-photon direct laser writing with variable repetition rate

Joachim Fischer, Jonathan B. Mueller, Johannes Kaschke, Thomas J. A. Wolf, Andreas-Neil Unterreiner, and Martin Wegener
Opt. Express 21(22) 26244-26260 (2013)