Abstract
Microlens arrays (MLAs) are widely used in optical imaging, dense wavelength division multiplexing, optical switching, and microstructure patterning, etc. However, the light modulation capability for both the conventional refractive-type MLA and planar diffractive-type MLA is still staying at the diffraction-limited scale. Here we propose and experimentally demonstrate a high numerical aperture (NA) supercritical lens (SCL) array which could achieve a sub-diffraction-limited focal spot lattice in the far field. The intensity distribution for all the focal spots has good uniformity with the lateral size around ${0.45}\lambda {\rm /NA}$ (0.75X Airy unit). The elementary unit in the SCL array composes a series of concentric belts with a feature size in micrometer scale. By utilizing an ultrafast ultraviolet lithography technique, a centimeter scale SCL array could be successfully patterned within 10 mins. Our results may provide possibilities for the applications in optical nanofabrication, super-resolution imaging, and ultrafine optical manipulation.
© 2020 Optical Society of America
Full Article | PDF ArticleMore Like This
Zhaoxia Zhang, Zhangyin Li, Jian Lei, Jin Wu, Kun Zhang, Sicong Wang, Yaoyu Cao, Fei Qin, and Xiangping Li
Opt. Lett. 46(10) 2296-2299 (2021)
Hui Duan, Minghui Wang, Xu Hu, Zhangyin Li, Meiling Jiang, Sicong Wang, Yaoyu Cao, Xiangping Li, and Fei Qin
Opt. Lett. 48(10) 2523-2526 (2023)
Yi Huang, Yanliang Qin, Pu Tu, Qi Zhang, Ming Zhao, and ZhenYu Yang
Opt. Lett. 45(16) 4460-4463 (2020)