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Pulsewidth-switchable ultrafast source at 114 nm

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Abstract

Femtosecond laser sources with high repetition rate in the ultraviolet (UV) and vacuum UV (VUV) are fundamental tools enabling tabletop time-resolved and angle-resolved photoemission spectroscopy in solids. We describe a VUV source at 114 nm (10.8 eV) based on an industrial grade ytterbium-doped ultrafast laser, a nonlinear pulse width selection stage, and two cascaded frequency tripling stages, first in crystals, second in xenon. The role of ionization in gas-based perturbative third harmonic generation phase-matching is analyzed using a simple theory, numerical simulations, and experimental data. The source features high photon flux, high repetition rate, and adjustable time resolutions. Thereby, in combination with a state-of-the-art angle-resolved photoemission spectroscopy (ARPES) apparatus it enables the study of the electronic dynamics of the whole Brillouin zone in a large number of materials.

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Corrections

19 October 2023: A typographical correction was made to the references.


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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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