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Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching

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Abstract

We report an electro-optic isolator fabricated on thin-film lithium niobate by photolithography-assisted chemo-mechanical etching that shows an isolation of 39.50 dB and an overall fiber-to-fiber loss of 2.6 dB.

© 2024 Optica Publishing Group

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Corrections

30 January 2024: A correction was made to the author listing.


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Data availability

Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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