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Embossing technique for fabricating integrated optical components in hard inorganic waveguiding materials

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Abstract

We describe a novel embossing technique for fabricating integrated optical components in hard and resistant inorganic waveguiding materials of good optical quality. The desired structure is embossed into a dip-coated deformable gel film prepared from organometallic solutions. Subsequent heat treatment transforms it into inorganic hard oxide material. We have successfully fabricated surface-relief gratings with 1200 lines/mm on SiO2–TiO2 waveguides (with refractive index nF ≃ 1.8, thickness dF ≃ 120 nm, and loss <1 dB/cm). The embossed gratings served as input and output grating couplers and as Bragg reflectors. We propose to fabricate other integrated optical components, for example, channel waveguides, with this method.

© 1983 Optical Society of America

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