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Optical Lithography in the Extreme UV

Stephen P. Renwick, David Williamson, Kazuaki Suzuki, and Katsuhiko Murakami

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Abstract

As the number of transistors on a chip continues to increase, the industry's shrinking feature size is outstripping even the best efforts of optical engineers. Extreme ultraviolet lithography can lead to a more-than-tenfold decrease in wavelength, translating to a startling leap in performance.

© 2007 Optical Society of America

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