Casamenti et al. present the pathway towards an elaborated 3D glass micromachining method by demonstrating improved aspect ratios, a higher process efficiency and faster processing times. Therefore, the authors identify key parameters in both the laser inscription and chemical etching process and investigate their correlation. By changing the exposure dose and the polarization of the femtosecond laser radiation, different regimes in the process windows are identified. The variation between a hydrofluoric-acid based and two hydroxide-based etchants reveals different etching mechanisms. Subsequent annealing after the laser inscription reveals thermal relaxation affecting the etching mechanism. The investigations executed reveal deeper insights into the selective laser-induced etching process (SLE) upon the influence of laser-induced defects in the glass matrix on the etching selectivity.
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