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Conferences > ACPC > 2019 > M4A > M4A.236
  • Asia Communications and Photonics Conference (ACPC) 2019
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper M4A.236

High Q AlN Ring Cavity with Wet Chemical Etching for Post-Treatment

Jia Liu, Xiang Ma, Shuai Wang, Hanling Long, Qiaoyin Lu, John Donegan, and Weihua Guo

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Abstract

A KOH aqueous solution is used to etch the epitaxial grown AlN layer following a dry etching process. Intrinsic quality factor (Q) of microring is significantly improved from 3.03×105 to 1.13×106.

© 2019 The Author(s)

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