Abstract
Optical spectroscopy can serve as a versatile noninvasive probe of thin film chemical processing to help monitor the progress of the processing, to unravel chemistry and transport in the gas phase and on the surface, and to help analyze the properties of the resulting materials. Several spectroscopic techniques are applied to probe localized laser-assisted etching of silicon and metals to submicrometer resolution.
© 1989 Optical Society of America
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