Abstract
In the etching of fused silica (SiO2) using a cw CO2 laser, visible plasmas are always generated whenever removal is measurable. The emission sources include the plasma plume, the hot spot on the sample, and a plasma image reflected by the etched surface. Utilizing a diaphragm in an intermediate image plane of the light collecting system, we measured spectra for different portions of the combined emission sources.
© 1989 Optical Society of America
PDF ArticleMore Like This
K. C. HSIAO, YUN-YEN J. YANG, S. D. ALLEN, and U. Iowa
CPD33 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989
H. DAIDO, E. MIURA, K. SAWAI, K. NISHIHARA, Y. KATO, Y. KITAGAWA, S. NAKAI, T. OTSUKI, Y. TSUNAWAKI, and C. YAMANAKA
THMM3 Quantum Electronics and Laser Science Conference (CLEO:FS) 1989
A.F. Mukhamedgalieva, A.M. Bondar, A.A. Ionin, Yu. M. Klimachev, D.V. Sinitsyn, and V.D. Zvorykin
CM_9 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2007