Abstract
We started this work in 1987 to develop a very high repetition rate excimer laser for many kinds of industrial application. A repetition rate of 5 kpps and an average power of 500 W are scheduled to be attained in 1994. This program includes studying key technologies, such as uniform and stable discharging, very fast gas flow, and extremely fast semiconductor switching.
© 1989 Optical Society of America
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