Abstract
Recent advances in high power, ultrashort pulse ArF excimer laser technology have led to development of ArF laser systems with peak powers in the 2-10 GW range.1-4 This paper reports on thedesign and performance of an ultrahigh-brightness ArF excimer system operating at the 0.1-TW level, based on a discharge pumped preamplifier and an electron-beam pumped power amplifier. For the generation of subpicosecond injection pulses at 193 nm, a spectrally compensated sum-frequency mixing scheme with ß-barium borate (BBO) as a nonlinear crystal is utilized.5
© 1993 Optical Society of America
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