Research on the ablation characteristics and increasement of electrical conductivity of C60 film by 308-nm excimer laser

Qihong Lou; Dong Ning; Jinxin Dong; Yunrong Wei

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1996),
paper CThK46

Research on the ablation characteristics and increasement of electrical conductivity of C₆₀ film by 308-nm excimer laser

Qihong Lou, Dong Ning, Jinxin Dong, and Yunrong Wei

Conference on Lasers and Electro-Optics 1996

Anaheim, California United States
2–7 June 1996
ISBN: 1-55752-443-2

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Thursday Poster Session (CThK)

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Q. Lou, D. Ning, J. Dong, and Y. Wei, "Research on the ablation characteristics and increasement of electrical conductivity of C60 film by 308-nm excimer laser," in Conference on Lasers and Electro-Optics, J. Bowers, D. Miller, D. Scifres, and A. Weiner, eds., Vol. 9 of OSA Technical Digest (Optica Publishing Group, 1996), paper CThK46.

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Abstract

Direct photoetching or ablation of some materials by pulsed ultraviolet excimer laser and the feasibility of using this "dry" lithography in microelectronics now promotes wide research. To date, most studies in this field focus on organic polymer. As a direct-gap semiconductor, because of some unusual properties derived from its unique football-like molecular structure, C₆₀ material may greatly influence the development of the semiconductor industry.

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