Phase-sensitive electric-field-induced second-harmonic microscopic probe of electronic materials

K. Wu; R. Carriles; M.C. Downer

Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies
Technical Digest (CD) (Optica Publishing Group, 2004),
paper CThJ3

Phase-sensitive electric-field-induced second-harmonic microscopic probe of electronic materials

K. Wu, R. Carriles, and M.C. Downer

Conference on Lasers and Electro-Optics 2004

San Francisco, California United States
16–21 May 2004
ISBN: 1-55752-770-9

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Nonlinear Characterization (CThJ)

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K. Wu, R. Carriles, and M. C. Downer, "Phase-sensitive electric-field-induced second-harmonic microscopic probe of electronic materials," in Conference on Lasers and Electro-Optics/International Quantum Electronics Conference and Photonic Applications Systems Technologies, Technical Digest (CD) (Optica Publishing Group, 2004), paper CThJ3.

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Abstract

We demonstrate an electric-field-induced second-harmonic microscope that measures both amplitude and phase of imaged second-harmonic light with sub-micron spatial resolution , thus providing complete characterization of dc field variations near metal -semiconductor junctions.

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