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Conferences > CLEO > 2008 > CMX > CMX5
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper CMX5

Extreme Ultraviolet Interferometric Lithography with a Desk-top system

P.W. Wachulak, M.C. Marconi, W. Rockward, D. Hill, E.H. Anderson, C.S. Menoni, and J.J. Rocca

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Abstract

We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100nm feature size.

© 2008 Optical Society of America

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