Abstract
Pulsed laser deposition method has a significant advantage for crystal growth of thin-film oxides in surroundings of oxygen. Therefore, it has been used extensively as an electronic film growth technique for high-quality, high-Tc superconductors. Recently, it has been a hot topic also for fabrication of optical thin films. By the way, thin-film structures of solid-state lasers such as neodymium-doped yttrium aluminum garnet (YAG), have gained great interest, because thin-film structures of such solid-state lasers are very attractive for waveguide lasers and integrated optics. If such thin-film structures of solid-state lasers are fabricated by the above pulsed laser deposition, the scheme becomes much more interesting because pulsed laser deposition would be a unique technique for in-situ processing unlike conventional crystal growth techniques. Therefore, we have proposed that the pulsed laser deposition could be a promising method to fabricate Nd:YAG thin films. In this study, we have grown by the pulsed laser deposition of Nd: Y3A15O12 (Nd: YAG) thin films on various substrates.
© 1995 IEEE
PDF ArticleMore Like This
Mizunori Ezak, Hiroshi Kumagai, Katsutarou Kobayashi, Koichi Toyoda, and Minoru Obara
CWF62 Conference on Lasers and Electro-Optics (CLEO:S&I) 1995
Makoto Shimokozono, Yasutake Ohishi, Yujiro Katoh, Naoto Sugimoto, and Akiyuki Tate
P61 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 1995
M. Ezaki, M. Obara, H. Kumagai, and K. Toyoda
CWG2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1996