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Conferences > CLEOPR > 2007 > ThP > ThP_042
  • Conference on Lasers and Electro-Optics/Pacific Rim 2007
  • (Optica Publishing Group, 2007),
  • paper ThP_042

Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography

Young-Seok Kim, Seok Ho Song, Sung-Hyun Oh, Yong-Kyu Choi, Beom-Hoan O, Se-Geun Park, El-Hang Lee, and Seung Gol Lee

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Abstract

We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.

© 2007 IEEE

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