Evaluation of Lasing Temperature Characteristics of 1550nm QD-based-LDs by IID-QDI Technique with Ar and B Ions and High Temperature Stability

A. Matsumoto; S. Isawa; R. Kaneko; K. Akahane; T. Umezawa; Y. Matsushima; K. Utaka

doi:10.1364/CLEO_AT.2020.JTh2D.6

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper JTh2D.6
•https://doi.org/10.1364/CLEO_AT.2020.JTh2D.6

Evaluation of Lasing Temperature Characteristics of 1550nm QD-based-LDs by IID-QDI Technique with Ar and B Ions and High Temperature Stability

A. Matsumoto, S. Isawa, R. Kaneko, K. Akahane, T. Umezawa, Y. Matsushima, and K. Utaka

CLEO: Applications and Technology 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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Joint Poster Session 14 (JTh2D)

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A. Matsumoto, S. Isawa, R. Kaneko, K. Akahane, T. Umezawa, Y. Matsushima, and K. Utaka, "Evaluation of Lasing Temperature Characteristics of 1550nm QD-based-LDs by IID-QDI Technique with Ar and B Ions and High Temperature Stability," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper JTh2D.6.

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Abstract

We evaluated temperature characteristics of QD-based-LDs by ion-implantation- induced-disordering quantum-dot intermixing technique with Ar and B ions, and demonstrated high temperature stability with a characteristic temperature of 284 K and a wavelength shift of 0.15 nm/°C.

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